List of Equipments
Deposition, Growth and Annealing systems
Dielectric Sputter System Electron Beam Evaporation (Aluminum) Electroplating System AMAT ENDURA PVD system Four-target Electron Beam Evaporator Furnaces 2” AMAT Gate Stack Centura Thermal Evaporator Hot Wire CVD (HWCVD) Inductively coupled plasma CVD (ICPCVD) Metal Sputtering System (NORDIKO) Plasma Immersion Ion Implantation (PIII) Pulsed LASER Deposition (PLD) Polymer evaporation system Rapid Thermal Processing (RTP) Silanization Set-up Thermal Evaporation System (Chrome-Gold) Ultech Furnaces Electrical characterization Fully Shielded Probe Station with Triax Chuck Fully Shielded ProbeStation with Triax Thermo Chuck Fully Shielded ProbeStation with Triax Thermo Chuck Mercury Probe Unshielded Probestation with BNC chuck Unshielded Probe Station with Thermo Chuck Unshielded ProbeStation with Thermo Chuck Material and structural characterization Atomic Force Microscope (AFM) Spectroscopic Ellipsometry Flurescene (research) Microscope Contact Angle Measurement Olympus Industrial Microscope Potentiostat Scanning Electrochemical Microscope (SECM) Spectrum 100 Optica FT-IR System Surface Profilometer Four Probe system UV-VIS-NIR spectrophotometer Reactive Ion Etch
AMAT Etch Centura Inductively Coupled Plasma RIE (ICPRIE) System STS RIE 320 PC Lithography
Double Side Aligner-EVG 620 JOEL SEM 6400 with Lithography Attachment MJB-3 mask aligner LASER Writer Raith 150 - Lithography Bonding tools
Wafer Bonder Wire Bonder Miscellaneous
Miscellaneous Wet benches